ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,052, issued on July 14, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Low pressure plasma etch process fo... Read More
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,053, issued on July 14, was assigned to Hitachi High-Tech Corp. (Tokyo). "Plasma processing method" was invented by Yohei Ishii (Hillsboro,... Read More
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,054, issued on July 14, was assigned to Tokyo Electron Ltd. (Tokyo). "Plasma processing method and plasma processing system" was invented b... Read More
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,055, issued on July 14, was assigned to Tokyo Electron Ltd. (Tokyo). "Semiconductor devices and methods of manufacturing the same" was inve... Read More
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,056, issued on July 14, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan). "Substrate treating method and substrate treating apparatu... Read More
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,057, issued on July 14, was assigned to YANGTZE MEMORY TECHNOLOGIES Co. LTD. (Wuhan, China). "Semiconductor device and method of forming th... Read More
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,058, issued on July 14, was assigned to FUJIFILM Corp. (Tokyo). "Polishing liquid and chemical mechanical polishing method" was invented by... Read More
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,059, issued on July 14, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Semiconductor device and method of ... Read More
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,060, issued on July 14, was assigned to TEXAS INSTRUMENTS Inc. (Dallas). "Methods of separating semiconductor dies" was invented by Michael... Read More
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,061, issued on July 14, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Apparatus and method for removal of oxide and carbon fr... Read More